DTU Danchip installs new equipment

The DTU Danchip cleanroom is installing two new ICP (Inductively Coupled Plasma) etching systems: An STS Pegasus Silicon Etcher for deep anisotropic silicon etching and an STS ICP-SR for dry etching of metals (mainly Al and Cr).

The installation and acceptance tests are expected to be completed by the end of March. A third ICP dry etching system for etching III-V materials is expected to be delivered in week 8 and will be installed shortly after.

In week 8, a system for 2-photon-polymerization from the company Nanoscribe is expected for delivery. This system will be installed in the yellow room in phase 3 of the cleanroom.

Finally, in week 8-9 DTU Danchip expects to complete the pre-acceptance test on the new multi-source PVD system (Cryofox 700 Flex from POLYTEKNIK). This system contains 2x e-beam sources (a single pocket source and a two pocket source) for co-evaporation (metal alloys) and 4x sputtering magnetrons (2 RF / 2 DC) for sputter deposition of metals and dielectrica a.o. piezo-materials.